G-Doping-Based Metal-Semiconductor Junction

نویسندگان

چکیده

Geometry-induced doping (G-doping) has been realized in semiconductors nanograting layers. G-doping-based p-p(v) junction fabricated and demonstrated with extremely low forward voltage reduced reverse current. The formation mechanism of proposed. To obtain G-doping, the surfaces p-type p+-type silicon substrates were patterned indents depth d = 30 nm. Ti/Ag contacts deposited on top G-doped layers to form metal-semiconductor junctions. two-probe method used record I–V characteristics four-probe deployed exclude contribution interface. collected data show a considerably lower current pattern. In case substrate, dramatically (by 1–2 orders magnitude). However, currents are not affected both substrates. We explained these unusual G-doping theory mechanism. decrease is by drop carrier generation rate which resulted from density quantum states within region. Analysis energy-band diagrams suggested that magnitude reduction depends relationship between depletion width.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Effect of molecular binding to a semiconductor on metal/molecule/semiconductor junction behavior.

Diodes made by (indirectly) evaporating Au on a monolayer of molecules that are adsorbed chemically onto GaAs, via either disulfide or dicarboxylate groups, show roughly linear but opposite dependence of their effective barrier height on the dipole moment of the molecules. We explain this by Au-molecule (electrical) interactions not only with the exposed end groups of the molecule but also with...

متن کامل

Metal-optic and Plasmonic Semiconductor-based Nanolasers

Metal-optic and Plasmonic Semiconductor-based Nanolasers

متن کامل

Metal-semiconductor-metal ultraviolet photodetector based on GaN

A metal-semiconductor-metal (MSM) ultraviolet photodetector has been fabricated using unintentionally doped n-GaN films grown on sapphire substrates. Its dark current, photocurrent under the illumination with λ = 360 nm light, responsivity, and the dependence of responsivity on bias voltage were measured at room temperature. The dark current of the photodetector is 1.03 nA under 5 V bias, and i...

متن کامل

High-responsivity plasmonics-based GaAs metal-semiconductor-metal photodetectors

photodetectors Ayman Karar, Narottam Das, Chee Leong Tan, Kamal Alameh, Yong Tak Lee, and Fouad Karouta Electron Science Research Institute, Edith Cowan University, Joondalup, WA, Australia School of Photonics Science, Gwangju Institute of Science and Technology (GIST), Gwangju, South Korea Department of Information and Communications, GIST, Gwangju, South Korea Department of Nanobio Materials ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Coatings

سال: 2021

ISSN: ['2079-6412']

DOI: https://doi.org/10.3390/coatings11080945