G-Doping-Based Metal-Semiconductor Junction
نویسندگان
چکیده
Geometry-induced doping (G-doping) has been realized in semiconductors nanograting layers. G-doping-based p-p(v) junction fabricated and demonstrated with extremely low forward voltage reduced reverse current. The formation mechanism of proposed. To obtain G-doping, the surfaces p-type p+-type silicon substrates were patterned indents depth d = 30 nm. Ti/Ag contacts deposited on top G-doped layers to form metal-semiconductor junctions. two-probe method used record I–V characteristics four-probe deployed exclude contribution interface. collected data show a considerably lower current pattern. In case substrate, dramatically (by 1–2 orders magnitude). However, currents are not affected both substrates. We explained these unusual G-doping theory mechanism. decrease is by drop carrier generation rate which resulted from density quantum states within region. Analysis energy-band diagrams suggested that magnitude reduction depends relationship between depletion width.
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ژورنال
عنوان ژورنال: Coatings
سال: 2021
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings11080945